• PECVD FURNACE 1

PECVD is a well-established technique for deposition of a wide variety of films. Many types of device require PECVD to create high-quality passivation or high-density masks.

Specifications

  • Maximum Temperature    : 1200 °C
  • ContinuouslyTemperature: 1100 °C
  • Tube Diameter                 : 80 mm
  • Heating Zone                    : 300 mm
  • Programmable LCD Touch Screen
  • 4 L/s Vacuum Pump
  • 3 MFC
  • Flange is Included


Options

  • Tube diameter can be changed between 30-200 mm optionally.
  • The heating zone can be selected between 200-440 mm.
  • The furnace can be selected with the option of heating up to three zones.
  • The furnace can be preferred as having a split type structure.
  • Mechanical pump power can be changed.
  • Turbo pump can be added.
  • A digital vacuum gauge can be added.
  • Channel number of MFC gases can be optionally added between 2-6.
  • Flange design can be changed according to the application.


We also accept R & D studies of the customer's design furnace with different specifications and different functions, please contact us by e-mail or telephone.


PECVD FURNACE 1

  • Brand: Optosense
  • Product Code: product 119
  • Availability: In Stock
  • $28,700.00

  • Ex Tax: $28,700.00

Tags: PECVD furnace, PECVD, furnace, Plasma-enhanced chemical vapor deposition, cvd, Plasma-enhanced chemical vapor deposition system, PECVD system, Plazma ile güçlendirilmiş kimyasal buhar biriktirme